Annealing furnaces are a process used in semiconductor device fabrication that involves heating a plurality of semiconductor wafers to affect their electrical properties. Heat treatment is designed for different effects. The wafer can be heated to activate dopants, to convert the film to or from the film to the wafer substrate interface, to allow the densely deposited film to change the state of the growing film, to repair the implanted damage, to move the dopant, The agent is transferred from one film to another or from the film into the wafer substrate.
Annealing furnaces can be integrated into other furnace processing steps, such as oxidation, or they can be handled on their own. Annealing furnace is designed for heating the semiconductor wafer equipment designed to complete. Annealing furnace is energy-saving periodic furnace, super energy-saving structure, the use of fiber structure, saving 60%.
Heat treatment furnace is divided into annealing furnace, quenching furnace, tempering furnace, normalizing furnace, quenching furnace, mainly used for large-scale carbon steel, alloy steel parts annealing; surface quenching tempering; welding stress relief annealing, aging and other heat treatment process. Electric heating heating, fuel, gas, coal, hot air circulation.
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